Thermal analysis of multilayer thin film structure processing with an infrared heat source. An overview
American Society of Mechanical Engineers, Heat Transfer Division, (Publication) HTD
Thermal processing of semiconductive multilayer thin film structures is used extensively for material quality improvement. These processes are highly dependent on the heat transfer characteristics of the process. Although trial and error techniques are still used for process parameter optimization, efforts have been made to understand the fundamental heat transfer mechanisms involved. This paper presents an overview of studies on thermal issues that affect the material quality of multilayer thin film structures during processing with an infrared heat source. Emphasis is given to investigations of zone-melting-recrystallization of silicon-on insulator structures using a graphite strip as a heat source. Studies on the conduction, macroscale and microscale radiation, processing chamber convection effects, motion of the heat source, and constitutional supercooling are reviewed. Analyses of thermally driven instabilities at the solid-liquid interface are also reported. Areas where further research is needed are also identified.
Miaoulis, M., Yoon, S., Robinson, R., Hess, C., & Wong, P. Y. (1991). Thermal analysis of multilayer thin film structure processing with an infrared heat source. An overview. American Society of Mechanical Engineers, Heat Transfer Division, (Publication) HTD, 184, 81-90. Retrieved from https://docs.rwu.edu/seccm_fp/187