Cross correlation of optical properties of thin films under thermal radiation
Document Type
Article
Publication Title
Journal of Applied Physics
Publication Date
12-1-1992
Abstract
Optical property and temperature distributions of a multilayer thin- (∼1 μm) film structure exposed to thermal radiation (1 μm≤λ≤8 μm) are dependent on film thicknesses, geometry, and material properties. Film thickness variation, simulated numerically, resulted in local minima and maxima in reflectivity and temperature distribution of these structures. We attribute this to a cross correlation phenomenon that occurs when the optical thickness of any two films in the structure is equal over a broad radiation spectrum.
Volume
72
Issue
10
First Page
4884
Last Page
4887
DOI
10.1063/1.352054
Recommended Citation
Wong, P., Trefethen, L., & Miaoulis, I. (1992). Cross correlation of optical properties of thin films under thermal radiation. Journal of Applied Physics, 72 (10), 4884-4887. https://doi.org/10.1063/1.352054
ISSN
00218979