Title

Thermal-radiation absorption characteristics of patterned wafers during rapid thermal processing

Document Type

Conference Proceeding

Publication Title

Materials Research Society Symposium - Proceedings

Publication Date

1-1-1994

Abstract

Microscale radiation effects are responsible for the dependence of absorption and temperature distributions on the geometry of the layering structures and the spectral characteristics of the heat source. The effect of patterned wafers, which may contain several different structures and materials, on the wafer absorption characteristics are investigated for rapid thermal processing. A numerical model to determine the thermal radiative absorptivity of the wafer for different structures and materials is presented for different heating conditions. The resulting transient effects are determined numerically for different rapid thermal processes. The changes in radiative properties for rapid thermal annealing and chemical vapor deposition are investigated for patterned wafers.

Volume

342

First Page

395

Last Page

400

DOI

10.1557/proc-342-395

ISSN

02729172

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